61-67

UDC 620.168.36
DOI: 10.15350/2306-2819.2018.1.61

INVESTIGATION OF TECHNOLOGICAL MODES OF RESISTIVE FILM
FORMATION BASED ON STAINLESS STEEL ELEMENTS OXIDES

A. V. Moroz
Volga State University of Technology,
3, Lenin Square, Yoshkar-Ola, 424000, Russian Federation
E-mail: MorozAV@volgatech.net

ABSTRACT

Introduction. Because of the need for the automation of the technological process of resistive films formation based on the 12х18н10т stainless steel elements oxide by the magnetron sputtering method, it is necessary to develop a mathematical model that will describe the given process adequately. The purpose of the work is the investigation of technological features of formation of resistive films of oxides and nitrides of stainless steel elements by the magnetron sputtering method. To achieve the purpose, the following tasks were solved: 1) the rotatable central composite design was implemented for developing the mathematical model of the process;2) the mathematical model of the process of the second order was calculated; 3) the adequacy of the obtained model was experimentally proved. The result of the mathematical modeling of the technological process was the regression equation, describing the process of resistive films formation with an accuracy of 5 %.

where ρ is surface resistivity, Ohm/⁬ ; η is oxygen concentration in the mixture of gases, in the range from 2 to 7 %, t is evaporation time, in the range from 10 to 600 sec.

The temperature coefficient of resistance (TCR) of films varies from positive to negative depending on the oxygen and nitrogen ratio in the working gaseous mixture when evaporating and it has values of the order of 10^-4 Ohm/К. Conclusion. During research the mathematical model of the technological process of resistive films formation, based on the 12х18н10т stainless steel oxide was calculated by the reaction magnetron sputtering method. Model adequacy was experimentally proved. Practical significance. This model can be applied for the automation of thin-film resistors formation process in thin-film microelectronics.

KEYWORDS

technological process automation; mathematical model; rotatable central composite design; resistors; magnetron sputtering; stainless steel; thin films

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For citation: Moroz A. V. Investigation of Technological Modes of Resistive Film Formation Based on Stainless Steel Elements Oxides. Vestnik of Volga State University of Technology. Ser.: Radio Engineering and Infocommunication Systems. 2018. No 1 (37). Pp. 61-67. DOI: 10.15350/2306-2819.2018.1.61